Prof. Dr. Kerstin Volz
Philipps-Universität Marburg
Department of Physics
Structure & Technology Research Laboratory (WZMW)
Hans-Meerwein-Straße, 35032 Marburg
Phone: +49 6421 28-22297
Fax: +49 6421 28-28935
Email: kerstin.volz@physik.uni-marburg.de
Expertise
Experimental Physics, structural characterization, transmission electron microscopy, epitaxial growth of semiconductor structures, correlation of structural optical and growth characteristics of functional materials
University Education
2006 | Habilitation (Dr. rer. nat. habil.) in Experimental Physics, Philipps-Universität Marburg, “Novel III/V semiconductor structures: from heteroepitaxial growth to quantitative nanoscale analysis” |
1999 | Doctoral degree in Physics (Dr. rer. nat.), Universität Augsburg / GSI Darmstadt / Philipps-Universität Marburg, Dissertation on “Composition and structure of SiC films formed by ion implantation techniques”, thesis advisor: Prof. W. Ensinger |
1996 | Diploma degree in Physics (Dipl. Phys.), U Augsburg, supervisor: Prof. B. Stritzker |
1990-96 | Studies in Physics, Universität Augsburg |
Professional Experience
2018-19 | Dean of the Department of Physics, Univ. Marburg |
2018- | Member of the Managing Board of the German Society for Electron Microscopy (DGE) |
2015- | Managing director of the WZMW |
2013- | Vice Speaker of the Collaborative Research Center (Sonderforschungsbereich) “Structure and Dynamics of Internal Interfaces” (SFB 1083) |
2012- | Speaker of the Research Training Group (Graduiertenkolleg) “Funktionalisierung von Halbleitern” (GRK 1782) |
2010- | Heisenberg-Professor (W3) for Experimental Physics, Philipps-Universität Marburg |
2009- | co-head (together with Dr. W. Stolz) of Structure and Technology Research Laboratory (STRL) of the WZMW, Philipps-Universität |
2009-10 | Heisenberg-Professor (W2) for Experimental Physics, Philipps-Universität Marburg |
2008-09 | Guest professor Institute of Physics, Humboldt Universität zu Berlin |
2003-08 | DFG-Junior Research group leader, WZMW, Philipps-Universität Marburg |
2002 | Guest scientist Stanford University (USA) (Prof. J. S. Harris): Feodor Lynen scholarship |
1997-00 | Several research stays at Osaka National Research Laboratory, Japan |
Honours, Awards and other Proofs of Qualification
2020- | Member of the “Forschungsbeirat” (Steering Committee) of the UMR |
2020- | Member of the “Forschungsrat” (Research Council) of the FCMH |
2018- | Member of the Cooperative Doctoral Platform for Engineering Sciences and of the Doctoral Committee of the FCMH |
2018- | Member of the board of the DGE (German Society for Electron Microscopy) |
2016- | Member of the MRS medal selection committee |
2016 | Call for a chair (W3) “Advanced Materials” Eberhard Karls Universität Tübingen in personal union with head of the Nanoanalytics Center, NMI, Reutlingen, declined |
2010 | Call for a chair (W3) “Angew. Physik – Halbleitermaterialien” TU Freiberg, declined |
2010 | Member at “Internetportal für exzellente Wissenschaftlerinnen” by Robert-Bosch Foundation and Spektrum-Verlag (upon recommendation by DFG) |
2009 | Patricia Pahamy teaching award, faculty of physics, Philipps-Universität Marburg |
2008 | Heisenberg professorship of DFG |
2001 | Feodor Lynen scholarship of Alexander von Humboldt Stiftung |
1996 | Graduate Student Award of EMRS |
Selected Publications
- P. J. Klar, H. Grüning, J. Koch, S. Schäfer, K. Volz, W. Stolz, W. Heimbrodt, A. M. Kamal Saadi, A. Lindsay, E. P. O´Reillly, (GaIn)(NAs)-fine structure of the band gap due to nearest neighbour configurations of the isovalent nitrogen, Phys. Rev. B 64, 121203 (2001).
- B. Kunert, K. Volz, J. Koch, W. Stolz, Direct band gap Ga(NAsP)-material system pseudomorphically grown on GaP-substrate, Appl. Phys. Lett. 88, 182108 (2006).
- I. Németh, B. Kunert, W. Stolz, K. Volz, Heteroepitaxy of GaP on Si: Correlation of morphology, anti-phase-domain structure and MOVPE growth conditions, J. Cryst. Growth 310, 1595 (2008).
- K. Volz, A. Beyer, W. Witte, J. Ohlmann, I. Németh, B. Kunert, W. Stolz, GaP-nucleation on exact (001) Si substrates for III/V-device integration, J. Cryst. Growth 315, 37 (2011).
- P. Ludewig, N. Knaub, N. Hossein, S. Reinhard, L. Nattermann, I. P. Marko, S. R. Jin, K. Hild, S. Chatterjee, W. Stolz, S. J. Sweeney, K. Volz, Electrical injection Ga(AsBi)/(AlGa)As single quantum well laser, Appl. Phys. Lett. 102, 242115 (2013).
- A. Beyer, A. Stegmüller, J. O. Oelerich, K. Jandieri, K. Werner, G. Mette, W. Stolz, Baranovskii, R. Tonner, K. Volz, Pyramidal structure formation at the interface between III/V semiconductors and silicon, Chem. Mater. 28, 3265 (2016).
- N. Rosemann, J. P. Eußner, A. Beyer, S. W. Koch, K. Volz, S. Dehnen, S. Chatterjee, A highly efficient directional molecular white-light emitter driven by a continuous-wave laser diode, Science 352, 1301 (2016).
- L. Duschek, P. Kükelhan, A. Beyer, S. Firoozabadi, J. O. Oelerich, C. Fuchs, W. Stolz, A. Ballabio, G. Isella, K. Volz, Composition determination of semiconductor alloys towards atomic accuracy by HAADF-STEM, Ultramicroscopy 200, 84 (2019).
- S. Ahmed, A. Pokle, S. Schweidler, A. Beyer, M. Bianchini, F. Walther, A. Mazilkin, P. Hartmann, T. Brezesinski, J. Janek, K. Volz, The Role of Intragranular Nanopores in Capacity Fade of Nickel-Rich Layered Li(Ni1–x–yCoxMny)O2 Cathode Materials, ACS Nano 13, 10694 (2019).
- S. Ahmed, M. Bianchini, A. Pokle, M. S. Munde, P. Hartmann, T Brezesinski, A. Beyer, J Janek, K. Volz, Visualization of Light Elements using 4D STEM: The Layered‐to‐Rock Salt Phase Transition in LiNiO2 Cathode Material, Adv. Energy Mater. 10, 2001026 (2020).
Patents
- K. Reuter, J. Sundermeyer, A. Merkulov, W. Stolz, K. Volz, M. Pokoj, Th. Ochs, Tantalund Niob-Verbindungen und ihre Verwendung in der Chemical Vapour Deposition, (DE102005033102A1 & US2007/0042213A1 (2007)).
- K. Reuter, J. Sundermeyer, A. Merkulov, W. Stolz, K. Volz, M. Pokoj, Th. Ochs, Wolfram und Molybdän-Verbindungen und ihre Verwendung in der Chemical Vapour Deposition, (DE102006000823A1 & US 2007/0160761 A1 (2007)).
- B. Kunert, J. Koch, S. Reinhard, K. Volz, W. Stolz, III/V-Halbleiter (102005004582.0 (2005)).
- C. v. Hänisch, B. Ringler, E. Sterzer, A. Beyer, W. Stolz, K. Volz, Verwendung wenigstens einer binären Gruppe 15-Elementverbindung, eine 13/15-Halbleiterschicht und binäre Gruppe 15-Elementverbindungen (DE 10 2014 014 036.9 (2015)).
- S. Dehnen, S. Chatterjee, J. P. Eussner, N. W. Rosemann, K. Volz, A. Beyer, Molecular white light emitter (WO2017211669A1 (2016)).